Journal
MICROELECTRONIC ENGINEERING
Volume 85, Issue 8, Pages 1792-1794Publisher
ELSEVIER
DOI: 10.1016/j.mee.2008.05.005
Keywords
surface enhanced Raman spectroscopy; plasmonic; e-beam lithography; plasma-etching
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By means of e-beam lithography, vacuum evaporation and ion-beam etching we have developed fabrication routes for the realisation of very small and sharp-edged metallic nanostructures which can be used as substrates for surface enhanced Raman spectroscopy (SERS). The metallic nanostructures are made from gold, are periodically arranged with a pitch of 250 nm and have sharp edges with corner radii of less than 20 nm. These structures show uniform SERS-signals across the whole field size of 200 x 200 mu m(2), and a dependency of the SERS signal intensity and of the signal-to-noise ratio on the pattern geometry. Thus the microfabricated SERS-substrates are suitable for practical applications. (C) 2008 Elsevier B.V. All rights reserved.
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