Journal
MICROELECTRONIC ENGINEERING
Volume 85, Issue 9, Pages 1924-1931Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2008.06.016
Keywords
UV-assisted thermal imprint; SU-8; surface pre-treatment; Ni mold; micro pattern
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Funding
- Hirose Sensing Technology Co., Ltd. (HST, Japan)
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In this study, we explored a rapid and low-cost process for patterning in a. SU-8 photoresist by thermal imprinting with a non-transparent mold such as Ni mold. One of major obstacles in the process is that the extremely good formability of uncured SU-8 even near room temperature causes the collapse of imprinted patterns during and after de-molding because a sample cannot be exposed to UV light during imprinting owing to the non-transparency of a mold. To overcome this problem, un-cured SU-8 resists were pre-treated with UV light, heat, and 02 plasma for controlling their formability, and applied to thermal imprint tests to be compared each other in terms of the replication fidelity. As a result, a SU-8 sample re-treated with UV light for 8 s resulted in the best replication quality for given imprint conditions and p mold dimensions, and we could successfully replicate micro patterns in SU-8 resist without a quartz mold. As compared with conventional UV-imprint processes, this process has potential merits such as a lower mold cost, an easier mold release and a less air-entrapment. (C) 2008 Elsevier B.V. All rights reserved.
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