Journal
MICROELECTRONIC ENGINEERING
Volume 85, Issue 5-6, Pages 1077-1082Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2008.01.088
Keywords
electron beam lithography; grayscale lithography; thick photoresist; tapered microchannels
Ask authors/readers for more resources
In this paper we report a process using electron beam lithography (EBL) to provide high-resolution prototyping of sub-wavelength patterned grayscale masks. The fabrication of such masks and the characterisation of grayscale patterning in thick optical resist are described. In addition, the application of these masks for the creation of three-dimensional tapered microstructures for use as masters in soft lithography for microfluidic devices is demonstrated. (C) 2008 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available