Journal
METALS AND MATERIALS INTERNATIONAL
Volume 18, Issue 6, Pages 957-964Publisher
KOREAN INST METALS MATERIALS
DOI: 10.1007/s12540-012-6007-2
Keywords
thin films; sputtering; corrosion; crystal structure; X-ray diffraction
Funding
- Department of Atomic Energy (DAE), Board of Research in Nuclear Sciences (BRNS), Mumbai [2006/37/37/BRNS/2068]
- Japan Society for the Promotion of Science, Japan
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Thin films of Zirconium Nitride (ZrN) were deposited by DC magnetron sputtering. The structure of the films was examined by X-ray diffraction and the crystallographic parameters were refined by Rietveld analysis. The columnar micro-structure was observed via cross-sectional SEM analysis. Defect induced, first order spectra were observed from Laser Raman studies. XPS showed the presence of Zr (N,O) ZrO2 phases on the surface of the film. The pitting corrosion was substantially reduced by the employment of Zr film as an interlayer. Corrosion tests revealed that ZrN films with a Zr interlayer exhibited clear passivation characteristics with considerably better corrosion resistance than the film without an interlayer.
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