Journal
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume 15, Issue 5, Pages 559-563Publisher
ELSEVIER SCI LTD
DOI: 10.1016/j.mssp.2012.04.008
Keywords
Nanostructures; Sol-process; TEM; XRD; EDX; alpha-MnO2
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Nanostructure of alpha-MnO2 was prepared by air oxidation of manganese chloride (MnCl2) via sol processing by adding N, N-Dimethylformamide (DMF) as surface active material. The obtained material was conventionally annealed at 400 degrees C for 2 h. The product was characterized by X-ray diffraction (XRD), Fourier transform infra-red spectroscopy (FTIR), energy dispersive spectroscopy (EDS), transmission electron microscopy (TEM), and selected area electron diffraction (SAED). The chemical reaction involved in the synthesis of alpha-MnO2 nanostructure was proposed and discussed. From XRD pattern, the purity and crystallinity of final product was observed. The synthesized alpha-MnO2 nanostructure showed an average crystallite size of 17 nm. (C) 2012 Elsevier Ltd. All rights reserved.
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