Journal
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS
Volume 157, Issue 1-3, Pages 32-35Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mseb.2008.12.004
Keywords
ZnO; Sputter deposition; Light-emitting diode; Heterostructure; Interfacial layer
Funding
- Ministry of Knowledge Economy (MIKE)
- Korea industrial Technology Foundation (KOTEF)
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Heterostructure light-emitting diodes (LEDs) were fabricated by growing Ga-doped n-Zno and undoped ZnO layers on p-GaN/Al2O3 templates. The p-n junction showed a diode like I-V characteristic and emitted electroluminescence (EL) peaks at 430 nm, 440 mn and 480 nm along with a broad band of yellow light. An interfacial layer was observed between ZnO and GaN, identified as ZnGa2O4 by transmission electron microscopy and X-ray diffraction analysis. It was observed that thickness of the interfacial layer did not significantly affect EL characteristics of the ZnO/GaN heterostructure LED. (C) 2009 Elsevier B.V. All rights reserved.
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