4.6 Article

Dielectric and ferroelectric properties of A-site non-stoichiometric Na0.5Bi0.5TiO3-based thin films

Journal

MATERIALS LETTERS
Volume 66, Issue 1, Pages 86-88

Publisher

ELSEVIER
DOI: 10.1016/j.matlet.2011.08.067

Keywords

Dielectrics; Ferroelectrics; Thin films; Epitaxial growth

Funding

  1. National Natural Science Foundation of China [51002064]
  2. Science and Technology Plan of Shandong provincial education department of China [J09LD19]
  3. Chinese Ministry of Education [210121]
  4. Outstanding Young Scientists Foundation Grant of Shandong Province [BS2009CL001]

Ask authors/readers for more resources

The A-site non-stoichiometry of [(Na0.7K0.2Li0.1)(0.45)Bi-0.55]TiO3 + x (NKLBT) films were epitaxially deposited on LaNiO3(100)/Si substrates using metal organic decomposition. The structural evolution of NKLBT films annealed at different temperatures is studied and a single perovskite phase can be found at the low temperature of 600 C. Ferroelectric hysteresis measurement shows a higher remanent polarization value of 15.6 mu C/cm(2) with a lower coercive field of 89 kV/cm at 450 kV/cm due to the lower concentration of oxygen vacancies by the donor doping effect. The frequency dependence of the capacitance-voltage behavior and the correlation between the capacitance-voltage and polarization-electric field are analyzed. The dielectric constant and dissipation factor are measured to be 690 and 0.04, respectively, at a frequency of 1 MHz. (C) 2011 Elsevier B.V. All rights reserved.

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