Journal
MATERIALS LETTERS
Volume 64, Issue 3, Pages 475-478Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.matlet.2009.11.052
Keywords
Magnesium; Thin film; Sputtering; Surface; Microstructure
Funding
- China Postdoctoral Science Foundation [20080430694]
- Shanghai Postdoctoral Scientific Program [08R214156]
- Zhejiang Province Key Technologies R D Program [2008C21055]
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Surface microstructurization is one of the important procedures to fabricate a superhydrophobic surface of materials. Thus, this study was focused on the modification of the surface microstructure of magnesium materials to tailor its wettability. Bias magnetron sputtering was used to prepare magnesium thin films. In the deposition process. a relatively dense magnesium film was obtained using the bias voltage of 200 V. A solution-immersion method was subsequently applied to modify the surface of the magnesium thin film. A honeycomb-like layer, mainly composed of Mg(OH)(2), was formed on the film's surface after the surface modification. Accordingly, this route provides a basis for the following surface functionization of magnesium materials. (C) 2009 Elsevier B.V. All rights reserved.
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