Journal
MACROMOLECULES
Volume 47, Issue 1, Pages 2-12Publisher
AMER CHEMICAL SOC
DOI: 10.1021/ma401762n
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Funding
- Nissan Chemical Company
- Rashid Engineering Regents Chair
- Welch Foundation [F-1709]
- IBM
- National Science Foundation [1120823, DGE-1110007]
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [1120823] Funding Source: National Science Foundation
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This Perspective addresses the current state of block copolymer lithography and identifies key challenges and opportunities within the field. Significant strides in experimental and theoretical thin film research have nucleated the transition of block copolymers from lab to fab, but outstanding questions remain about the optimal materials, processes, and analytical techniques for first-generation devices and beyond. Particular attention herein is focused on advances and issues related to thermal annealing. Block copolymers are poised to change the traditional lithographic resolution enhancement paradigm from top-down to bottom-up.
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