Journal
MACROMOLECULES
Volume 46, Issue 19, Pages 7567-7579Publisher
AMER CHEMICAL SOC
DOI: 10.1021/ma401112y
Keywords
-
Categories
Funding
- National Science Foundation [NSF DMR-1207041]
- MIT
- DuPont
- Direct For Mathematical & Physical Scien
- Division Of Materials Research [1207041] Funding Source: National Science Foundation
Ask authors/readers for more resources
Block copolymers have garnered significant attention in the past few decades due to their ability to self-assemble into nanoscale structures (similar to 10-100 nm), making them ideal for emerging nanotechnologies, such as nanolithography, nanotemplating, nanoporous membranes, and ultrahigh-density storage media. Many of these applications require thin film geometries, in which the block copolymers form well-ordered nanostructures and/or precisely controlled domain orientations. In this Perspective, we discuss recent progress toward techniques that achieve directed self-assembly of block copolymer thin films. Substrate prepatterning, nanoimprint lithography, molecular transfer printing, solvent treatment, and zone processing approaches are highlighted. Finally, we comment on recent developments in high-throughput and in situ characterization methods, and we provide future research directions for thin film nanostructure refinement.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available