Journal
MACROMOLECULAR MATERIALS AND ENGINEERING
Volume 295, Issue 4, Pages 351-354Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/mame.200900352
Keywords
H-Si(111); initiator; photopolymerization; silyl radicals
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Nowadays, silicon represents the most important material used for microelectronic applications. In this paper, both H-Si (111) surfaces and H-Si powders are used to initiate a multifunctional acrylate photopolymerization. The polymers formed are characterized by IR spectroscopy. This should be the way to create either an acrylate polymer coating on a Si wafer or a polymer film containing covalently linked silicon particles.
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