4.4 Article

Design of Patterned Surfaces with Selective Wetting Using Nanoimprint Lithography

Journal

MACROMOLECULAR CHEMISTRY AND PHYSICS
Volume 211, Issue 24, Pages 2636-2641

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/macp.201000483

Keywords

controlled wettability; lithography; nanoimprinting; nanotechnology; superhydrophobic surface

Funding

  1. Center for Nanoscale Mechatronics and Manufacturing [08K1401-00210]
  2. Korean Ministry of Education, Science, and Technology

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The fabrication of flexible surfaces with a combination of ultrahydrophobic and hydrophilic properties at alternating locations by UV NIL is reported. A new method for master fabrication based on nanoimprinting combined with photolithography is described. The master is used for a double replica technique to imprint nanopillars atop microstripes on a plastic substrate. Selective wetting is achieved due to ultrahydrophobic nanopatterned regions with 126 degrees WCA and hydrophilic flat regions with 708 WCA on a single surface. By covering surface with hydrophobic SAM, a static contact angle of nanopillars is increased up to 1638 indicating superhydrophobicity. We also show that the Cassie-Wenzel theory successfully predicts the experimental apparent contact angles.

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