Journal
MACROMOLECULAR CHEMISTRY AND PHYSICS
Volume 210, Issue 16, Pages 1303-1309Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/macp.200900178
Keywords
base amplifier; branched oligomer; epoxy resin; films; pencil hardness; photogenerated base; resins; UV-curing
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Funding
- Industrial Technology Research Grant Program [04A25522d]
- New Energy and Industrial Technology Development Organization (NEDO) of Japan
- Sekisui Chemical Co., Ltd
- National Institute of Advanced Industrial Science and Technology (AIST) for MALDI-TOF/NIS measurements
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This paper describes the preparation and the enhancing effect on anionic UV-curing of epoxy resins of three and four-armed oligomers bearing 9-fluorenylmethyl carbarnate residues, which displayed the autocatalytic formation of primary amino residues triggered by a photogenerated amine. The branched oligomers were readily synthesized by the Michael addition of the corresponding polythiol with 9-fluorenylmethyl 2-acryloyloxyethylcarbamate, which were obtained from 9-fluorenylmethanol and commercially available 2-isocyanatoethyl acrylate. Films of poly(glycidyl methacrylate) and a glycidylated novolac resin doped with a photobase generator exhibited boosted photosensitivity leading to photoinsolubilization in the presence of the base-amplifying oligomers. The more marked effect of the branched oligomers on UV-curing of epoxy resins was demonstrated by using films of a fluid epoxy, which were converted into hard films after UV exposure and postexposure baking, whereas no hardening occurred in the absence of the oligomers.
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