4.3 Article

OES analysis in a nonthermal plasma used for toxic gas removal: Rotational and excitation temperature estimation

Journal

LASER PHYSICS
Volume 18, Issue 3, Pages 303-307

Publisher

IOP PUBLISHING LTD
DOI: 10.1134/S1054660X08030183

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Nonthermal plasma technologies are often used for cleaning toxic gases. In this work, we will present an optical emission spectroscopy (OES) study in a dielectric barrier discharge (DBD) used to remove NO (x) specifically. Rotational temperatures are calculated from the UV-OH band (A(2)Sigma, nu = 0 -> X-2 Pi nu' = 0) situated between 306-310 nm; for the rotational temperature, a fitting method was employed (comparison between experimental data with a synthetic molecular spectrum). Excitation temperatures were calculated using OII atomic lines situated in a wavelength range of 300-700 nm using a Boltzman's plot method. From calculated temperatures, a thermal inequity characteristic of nonthermal plasma discharges has been high-lighted. The influence of the percentage of water added to the DBD reactor is also studied in the removal efficiency and in the OH band intensities and temperatures.

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