Journal
LANGMUIR
Volume 27, Issue 15, Pages 9073-9076Publisher
AMER CHEMICAL SOC
DOI: 10.1021/la2016929
Keywords
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Funding
- U. S. Department of Energy [DE-SC0001088]
- Office of Science
- Office of Basic Energy Sciences
- Clare Boothe Luce Foundation
- NSF [1001994]
- U.S. Department of Energy (DOE) [DE-SC0001088] Funding Source: U.S. Department of Energy (DOE)
- Directorate For Engineering
- Div Of Electrical, Commun & Cyber Sys [1001994] Funding Source: National Science Foundation
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We demonstrate that contact patterning subtractively patterns a wide range of molecular organic films of nanoscale thickness with nanometer-scale accuracy. In contact patterning, an elastomeric stamp with raised features is brought into contact with the organic film and subsequently removed, generating patterns by the diffusion of the film molecules into the stamp. The mechanism of material removal via diffusion is documented over spans of minutes, hours, and days and is shown to be consistently repeatable. Contact patterning provides a photolithography-free, potentially scalable approach to subtractive patterning of a wide range of molecular organic films.
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