Journal
LANGMUIR
Volume 26, Issue 9, Pages 6164-6166Publisher
AMER CHEMICAL SOC
DOI: 10.1021/la101077t
Keywords
-
Funding
- NTU
- MOE, CRP [NRF-CRP2-2007-01]
- NRF
- SERC [092 101 0064]
- A*STAR
- Centre for Biomimetic Sensor Science it NM, Singapore
Ask authors/readers for more resources
Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns Os templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available