4.6 Article

Lateral structures of buried interfaces in ABA-type triblock copolymer films

Journal

LANGMUIR
Volume 24, Issue 15, Pages 7639-7644

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/la801539r

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The lateral structure of an ABA-type triblock copolymer polyparamethylstyrene-block-polystyrene-block-polypararnethyl styrene at the buried silicon substrate interface is studied as a function of different Substrate Surface treatments. With grazing incidence small-angle neutron scattering (GISANS), high interface sensitivity is reached. With GISANS, the orientation and degree of order of the morphology are probed. The powderlike oriented lamellar structure in the bulk orients along the surface normal in the vicinity of the substrate. A modification of the short-ranged interface potential of the Substrate introduces a lateral stretching of this lamellar structure Of LIP to 8% as compared to the bulk. The decay in stretching toward the volume structure is probed with depth profiling. It extends at least up to a distance of 51 nm from the solid surface.

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