4.7 Article

Patterning microfluidic device wettability using flow confinement

Journal

LAB ON A CHIP
Volume 10, Issue 14, Pages 1774-1776

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c004124f

Keywords

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Funding

  1. NSF [DMR-0602684]
  2. Harvard MRSEC [DMR-0820484]
  3. Massachusetts Life Sciences Center
  4. Chemical Industry (Germany)

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We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

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