Journal
LAB ON A CHIP
Volume 9, Issue 7, Pages 863-866Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/b821930c
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Funding
- Kwanjeong Educational Foundation [CTS-0304128]
- MIT Deshpande Center
- Singapore-MIT Alliance
- Royal Society of Chemistry Journal Grant
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We present a method called Lock Release Lithography (LRL) that utilizes a combination of channel topography, mask design, and pressure-induced channel deformation to form and release particles in a cycled fashion. This technique provides a means for the high-throughput production of particles with complex 3D morphologies and composite particles with spatially configurable chemistries. In this work, we demonstrate a diverse set of functional particles including those displaying heterogeneous swelling characteristics and containing functional entities such as nucleic acids, proteins and beads.
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