4.7 Article

Localized heating on silicon field effect transistors: Device fabrication and temperature measurements in fluid

Journal

LAB ON A CHIP
Volume 9, Issue 19, Pages 2789-2795

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/b906048k

Keywords

-

Funding

  1. NIH [R21-EB006308, R01CA20003]
  2. NSF [ECS 0554990]
  3. Indiana Elks administered through the Purdue University Cancer Center
  4. NATIONAL CANCER INSTITUTE [R01CA120003] Funding Source: NIH RePORTER
  5. NATIONAL INSTITUTE OF BIOMEDICAL IMAGING AND BIOENGINEERING [R21EB006308] Funding Source: NIH RePORTER

Ask authors/readers for more resources

We demonstrate electrically addressable localized heating in fluid at the dielectric surface of silicon-on-insulator field-effect transistors via radio-frequency Joule heating of mobile ions in the Debye layer. Measurement of fluid temperatures in close vicinity to surfaces poses a challenge due to the localized nature of the temperature profile. To address this, we developed a localized thermometry technique based on the fluorescence decay rate of covalently attached fluorophores to extract the temperature within 2 nm of any oxide surface. We demonstrate precise spatial control of voltage dependent temperature profiles on the transistor surfaces. Our results introduce a new dimension to present sensing systems by enabling dual purpose silicon transistor-heaters that serve both as field effect sensors as well as temperature controllers that could perform localized bio-chemical reactions in Lab on Chip applications.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.7
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available