Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 6, Pages 2337-2341Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.3244590
Keywords
annealing; gallium compounds; III-V semiconductors; leakage currents; light emitting diodes; passivation; plasma materials processing; wide band gap semiconductors
Funding
- NSF RII [EPS 0554328]
- WVU Research Corp.
- WV EPSCoR Office
- IC Inova, Inc.
Ask authors/readers for more resources
The effects of thermal annealing and wet chemical treatments on the electrical characteristics of GaN-based light emitting diodes (LEDs) integrated with a microhole array were studied. It was found that KOH can etch off the plasma-damaged materials, leading to a complete suppression of surface leakage currents. It, however, attacked metal contacts and compromised the forward turn-on characteristics. Thermal annealing removed damage in the near-surface bulk region, whereas (NH(4))(2)S treatment only passivated surface states. Both methods produced a partial recovery of the electrical characteristics of the perforated LEDs. It has been found that a complete removal of plasma damage in the perforated LEDs can be realized by thermal annealing used in conjunction with sulfide passivation.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available