Related references
Note: Only part of the references are listed.The Role of Organic Capping Layers of Platinum Nanoparticles in Catalytic Activity of CO Oxidation
Jeong Y. Park et al.
CATALYSIS LETTERS (2009)
Sum Frequency Generation and Catalytic Reaction Studies of the Removal of Organic Capping Agents from Pt Nanoparticles by UV-Ozone Treatment
Cesar Aliaga et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2009)
Influence of reaction with XeF2 on surface adhesion of Al and Al2O3 surfaces
Tianfu Zhang et al.
APPLIED PHYSICS LETTERS (2008)
The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks
Leonid Belau et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2008)
Extreme ultraviolet lithography: A review
Banqiu Wua et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2007)
Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks
Ted Liang et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2007)
Oxidation and reduction of thin Ru films by gas plasma
Y. Iwasaki et al.
APPLIED SURFACE SCIENCE (2007)
Oxidation and reduction of ultrathin nanocrystalline ru films on silicon: Model system for Ru-capped extreme ultraviolet lithography optics
Y. B. He et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2007)
Long-term stability of Ru-based protection layers in extreme ultraviolet lithography: A surface science approach
H. Over et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2007)
Atomic hydrogen cleaning of surface ru oxide formed by extreme ultraviolet irradiation of Ru-capped multilayer mirrors in H2O ambience
Hiroaki Oizumi et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS (2007)
The evolution of model catalytic systems; studies of structure, bonding and dynamics from single crystal metal surfaces to nanoparticles, and from low pressure (< 10(-3) Torr) to high pressure (> 10(-3) Torr) to liquid interfaces
Gabor A. Somorjai et al.
PHYSICAL CHEMISTRY CHEMICAL PHYSICS (2007)
Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography
Theodore E. Madey et al.
APPLIED SURFACE SCIENCE (2006)
Kinetic simulation of an extreme ultraviolet radiation driven plasma near a multilayer mirror
M. H. L. van der Velden et al.
JOURNAL OF APPLIED PHYSICS (2006)
Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers
Sasa Bajt et al.
JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS (2006)
Etching of ruthenium coatings in O-2- and Cl-2-containing plasmas
CC Hsu et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2006)
Reduction of oxide layer on Ru surface by atomic-hydrogen treatment
I Nishiyama et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2005)
Particle adhesion and removal on EUV mask layers during wet cleaning
SH Lee et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS (2005)
Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation
K Hamamoto et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2005)
Optimization of multilayer reflectors for extreme ultraviolet lithography
MF Bal et al.
JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS (2004)
Improved reflectance and stability of Mo-Si multilayers
S Bajt et al.
OPTICAL ENGINEERING (2002)