Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 4, Pages 1919-1925Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.3167368
Keywords
atomic force microscopy; corrosion; etching; hydrogen compounds; oxidation; ozone; ruthenium; scanning electron microscopy; surface morphology; surface roughness; water; X-ray photoelectron spectra
Funding
- Intel Corp.
- Director, Office of Science
- Office of Basic Energy Sciences of the U. S. Department of Energy [DEAC02-05CH11231]
- Directorate For Engineering
- Div Of Engineering Education and Centers [832785] Funding Source: National Science Foundation
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The authors report the chemical influence of cleaning of the Ru capping layer on the extreme ultraviolet (EUV) reflector surface. The cleaning of EUV reflector to remove the contamination particles has two requirements: to prevent corrosion and etching of the reflector surface and to maintain the reflectivity functionality of the reflector after the corrosive cleaning processes. Two main approaches for EUV reflector cleaning, wet chemical treatments [sulfuric acid and hydrogen peroxide mixture (SPM), ozonated water, and ozonated hydrogen peroxide] and dry cleaning (oxygen plasma and UV/ozone treatment), were tested. The changes in surface morphology and roughness were characterized using scanning electron microscopy and atomic force microscopy, while the surface etching and change of oxidation states were probed with x-ray photoelectron spectroscopy. Significant surface oxidation of the Ru capping layer was observed after oxygen plasma and UV/ozone treatment, while the oxidation is unnoticeable after SPM treatment. Based on these surface studies, the authors found that SPM treatment exhibits the minimal corrosive interactions with Ru capping layer. They address the molecular mechanism of corrosive gas and liquid-phase chemical interaction with the surface of Ru capping layer on the EUV reflector.
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