4.2 Article

Direct e-beam writing of 1 nm thin carbon nanoribbons

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 6, Pages 3059-3062

Publisher

A V S AMER INST PHYSICS
DOI: 10.1116/1.3253536

Keywords

annealing; electron beam lithography; graphene; monolayers; nanostructured materials; self-assembly

Funding

  1. Volkswagenstiftung
  2. Deutsche Forschungsgemeinschaft

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The fabrication of 1 nm thin carbon nanoribbons and nanorings is demonstrated. Aromatic self-assembled monolayers are locally cross-linked by electron beam lithography into polymeric carbon nanosheets. Annealing at 1200 K in ultrahigh vacuum transforms these electrically insulating nanosheets into a conducting two-dimensional phase consisting of nanopatches of graphene with a sheet conductivity of similar to 10(-2) S sq. The method allows the direct writing of patterns into the monolayer, permitting the resistless fabrication of arbitrarily sized and shaped carbon nanostructures with a thickness of 1 nm.

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