Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 26, Issue 6, Pages 2596-2600Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.2968614
Keywords
atomic force microscopy; diamond; elemental semiconductors; ion beam applications; ion sources; quantum interference devices; semiconductor doping; silicon; transients
Funding
- Direct For Mathematical & Physical Scien
- Division Of Materials Research [0801388] Funding Source: National Science Foundation
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The ability to inject dopant atoms with high spatial resolution, flexibility in dopant species, and high single ion detection fidelity opens opportunities for the study of dopant fluctuation effects and the development of devices in which function is based on the manipulation of quantum states in single atoms, such as proposed quantum computers. The authors describe a single atom injector, in which the imaging and alignment capabilities of a scanning force microscope (SFM) are integrated with ion beams from a series of ion sources and with sensitive detection of current transients induced by incident ions. Ion beams are collimated by a small hole in the SFM tip and current changes induced by single ion impacts in transistor channels enable reliable detection of single ion hits. They discuss resolution limiting factors in ion placement and processing and paths to single atom (and color center) array formation for systematic testing of quantum computer architectures in silicon and diamond.
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