☆ 4.2 Article

Etching rate, optical transmittance, and charge trapping characteristics of Al-rich Al2O3 thin film fabricated by rf magnetron cosputtering

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2008)

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Etching rate, optical transmittance, and charge trapping characteristics of Al-rich Al2O3 thin film fabricated by rf magnetron cosputtering

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