Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 32, Issue 1, Pages -Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.4843595
Keywords
-
Ask authors/readers for more resources
Molybdenum trioxide films have been deposited using thermal atomic layer deposition techniques with bis(tert-butylimido)bis(dimethylamido) molybdenum. Films were deposited at temperatures from 100 to 300 degrees C using ozone as the oxidant for the process. The Mo precursor was evaluated for thermal stability and volatility using thermogravimetric analysis and static vapor pressure measurements. Film properties were evaluated with ellipsometry, x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, and secondary electron microscopy. The growth rate per cycle was determined to extend from 0.3 to 2.4 angstrom/cycle with <4% nonuniformity (1-sigma) with-in-wafer across a 150mm wafer for the investigated temperature range. (C) 2014 American Vacuum Society.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available