Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 32, Issue 1, Pages -Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.4826941
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Funding
- National Science Foundation [CBET 1067424, 1346282, EEC 1062943]
- Div Of Chem, Bioeng, Env, & Transp Sys
- Directorate For Engineering [1067424] Funding Source: National Science Foundation
- Div Of Engineering Education and Centers
- Directorate For Engineering [1062943] Funding Source: National Science Foundation
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The authors report a new chemical approach for the selective atomic layer deposition of ultrathin layers of zirconium oxide (ZrO2) on copper patterned silicon surfaces. Instead of using common atomic layer deposition (ALD) oxygen sources such as water, oxygen, or ozone, the authors use ethanol, which serves as oxygen source for the ALD on the silicon side and as effective reducing agent on the copper side, thereby selectively depositing ZrO2 film on the silicon surface of the substrate without any deposition on copper up to at least 70 ALD cycles. The resulting ZrO2 nanofilm is found to be an effective copper diffusion barrier at temperatures at least up to 700 degrees C. (C) 2014 American Vacuum Society.
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