Related references
Note: Only part of the references are listed.A strategy for increased carbon ionization in magnetron sputtering discharges
Asim Aijaz et al.
DIAMOND AND RELATED MATERIALS (2012)
Steady state discharge optimization in high-power impulse magnetron sputtering through the control of the magnetic field
J. Capek et al.
JOURNAL OF APPLIED PHYSICS (2012)
An introduction to thin film processing using high-power impulse magnetron sputtering
Daniel Lundin et al.
JOURNAL OF MATERIALS RESEARCH (2012)
The 'recycling trap': a generalized explanation of discharge runaway in high-power impulse magnetron sputtering
A. Anders et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2012)
More evidence for azimuthal ion spin in HiPIMS discharges
P. Poolcharuansin et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2012)
Reactive ionized physical vapor deposition of thin films
S. Konstantinidis et al.
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS (2011)
Temporal Evolution of the Ion Fluxes for Various Elements in HIPIMS Plasma Discharge
Ante Hecimovic et al.
IEEE TRANSACTIONS ON PLASMA SCIENCE (2011)
Fast Imaging Investigation on Pulsed Magnetron Discharge
Claudiu Costin et al.
IEEE TRANSACTIONS ON PLASMA SCIENCE (2011)
Recent advances in modulated pulsed power magnetron sputtering for surface engineering
Jianliang Lin et al.
JOM (2011)
A non-stationary model for high power impulse magnetron sputtering discharges
Tomas Kozak et al.
JOURNAL OF APPLIED PHYSICS (2011)
Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering discharge
F. Magnus et al.
JOURNAL OF APPLIED PHYSICS (2011)
Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films
A. P. Ehiasarian et al.
JOURNAL OF APPLIED PHYSICS (2011)
Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate
H. Naghshara et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2011)
Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere
W. P. Leroy et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2011)
The 2D plasma potential distribution in a HiPIMS discharge
A. Mishra et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2011)
Effects of the magnetic field strength on the modulated pulsed power magnetron sputtering of metallic films
Jianliang Lin et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2011)
Study of plasma dynamics in a modulated pulsed power magnetron discharge using a time-resolved Langmuir probe
L. Meng et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2011)
Optical studies of plasma inhomogeneities in a high-current pulsed magnetron discharge
A. V. Kozyrev et al.
PLASMA PHYSICS REPORTS (2011)
An ionization region model for high-power impulse magnetron sputtering discharges
M. A. Raadu et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2011)
Optimizing efficiency of Ti ionized deposition in HIPIMS
A. E. Ross et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2011)
Internal current measurements in high power impulse magnetron sputtering
Daniel Lundin et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2011)
Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O2 atmosphere
Martin Cada et al.
SURFACE & COATINGS TECHNOLOGY (2011)
The evolution of the IEDFs in a low-pressure HiPIMS discharge
P. Poolcharuansin et al.
SURFACE & COATINGS TECHNOLOGY (2011)
Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
Montri Aiempanakit et al.
SURFACE & COATINGS TECHNOLOGY (2011)
Discharge physics of high power impulse magnetron sputtering
Andre Anders
SURFACE & COATINGS TECHNOLOGY (2011)
On surface temperatures during high power pulsed magnetron sputtering using a hot target
J. Tesar et al.
SURFACE & COATINGS TECHNOLOGY (2011)
Studies of hysteresis effect in reactive HiPIMS deposition of oxides
T. Kubart et al.
SURFACE & COATINGS TECHNOLOGY (2011)
Mitigating the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering
G. Greczynski et al.
THIN SOLID FILMS (2011)
Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering
F. Magnus et al.
THIN SOLID FILMS (2011)
Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides
Montri Aiempanakit et al.
THIN SOLID FILMS (2011)
Ion density increase in high power twin-cathode magnetron system
O. V. Vozniy et al.
VACUUM (2011)
Ion acceleration and cooling in gasless self-sputtering
David Horwat et al.
APPLIED PHYSICS LETTERS (2010)
Time- and Species-Resolved Plasma Imaging as a New Diagnostic Approach for HiPIMS Discharge Characterization
Matej Hala et al.
IEEE TRANSACTIONS ON PLASMA SCIENCE (2010)
CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
Grzegorz Greczynski et al.
IEEE TRANSACTIONS ON PLASMA SCIENCE (2010)
HiPIMS Ion Energy Distribution Measurements in Reactive Mode
Pierre-Yves Jouan et al.
IEEE TRANSACTIONS ON PLASMA SCIENCE (2010)
Plasma Parameters in a Pre-Ionized HiPIMS Discharge Operating at Low Pressure
Phitsanu Poolcharuansin et al.
IEEE TRANSACTIONS ON PLASMA SCIENCE (2010)
Origin of the Delayed Current Onset in High-Power Impulse Magnetron Sputtering
Georgy Yu. Yushkov et al.
IEEE TRANSACTIONS ON PLASMA SCIENCE (2010)
Spatial and temporal evolution of ion energies in high power impulse magnetron sputtering plasma discharge
A. Hecimovic et al.
JOURNAL OF APPLIED PHYSICS (2010)
Compression and strong rarefaction in high power impulse magnetron sputtering discharges
David Horwat et al.
JOURNAL OF APPLIED PHYSICS (2010)
Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium
J. Lazar et al.
JOURNAL OF APPLIED PHYSICS (2010)
Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films
Vitezslav Stranak et al.
JOURNAL OF APPLIED PHYSICS (2010)
Dynamics of reactive high-power impulse magnetron sputtering discharge studied by time- and space-resolved optical emission spectroscopy and fast imaging
M. Hala et al.
JOURNAL OF APPLIED PHYSICS (2010)
The origin of Bohm diffusion, investigated by a comparison of different modelling methods
E. Bultinck et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2010)
High power impulse magnetron sputtering using a rotating cylindrical magnetron
W. P. Leroy et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2010)
Deposition rates of high power impulse magnetron sputtering: Physics and economics
Andre Anders
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2010)
A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering
J. Vlcek et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2010)
The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate
Anurag Mishra et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2010)
Short- and long-term plasma phenomena in a HiPIMS discharge
P. Poolcharuansin et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2010)
High-power impulse magnetron sputtering and its applications
Arutiun P. Ehiasarian
PURE AND APPLIED CHEMISTRY (2010)
Dual-magnetron open field sputtering system for sideways deposition of thin films
Asim Aijaz et al.
SURFACE & COATINGS TECHNOLOGY (2010)
High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition
Andre Anders
SURFACE & COATINGS TECHNOLOGY (2010)
Control of reactive high power impulse magnetron sputtering processes
M. Audronis et al.
SURFACE & COATINGS TECHNOLOGY (2010)
On the film density using high power impulse magnetron sputtering
Mattias Samuelsson et al.
SURFACE & COATINGS TECHNOLOGY (2010)
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
K. Sarakinos et al.
SURFACE & COATINGS TECHNOLOGY (2010)
Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias
M. Lattemann et al.
THIN SOLID FILMS (2010)
Spatial and temporal investigation of high power pulsed magnetron discharges by optical 2D-imaging
B. Liebig et al.
THIN SOLID FILMS (2010)
Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit
J. Paulitsch et al.
THIN SOLID FILMS (2010)
Completely flat erosion magnetron sputtering using a rotating asymmetrical yoke magnet
Takayuki Iseki
VACUUM (2010)
The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool
J. T. Gudmundsson
VACUUM (2010)
Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N2 atmospheres
G. Greczynski et al.
VACUUM (2010)
High power pulsed magnetron sputtering: Fundamentals and applications
J. Alami et al.
JOURNAL OF ALLOYS AND COMPOUNDS (2009)
On the electron energy in the high power impulse magnetron sputtering discharge
J. T. Gudmundsson et al.
JOURNAL OF APPLIED PHYSICS (2009)
Time evolution of ion energies in HIPIMS of chromium plasma discharge
A. Hecimovic et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2009)
Energy flux measurements in high power impulse magnetron sputtering
Daniel Lundin et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2009)
Faster-than-Bohm Cross-B Electron Transport in Strongly Pulsed Plasmas
N. Brenning et al.
PHYSICAL REVIEW LETTERS (2009)
Self-Sputtering Far above the Runaway Threshold: An Extraordinary Metal-Ion Generator
Joakim Andersson et al.
PHYSICAL REVIEW LETTERS (2009)
Investigation of plasma characteristics in an unbalanced magnetron sputtering system
A. A. Solov'ev et al.
PLASMA PHYSICS REPORTS (2009)
Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges
A. D. Pajdarova et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2009)
Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering
Daniel Lundin et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2009)
Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering
J. Lin et al.
SURFACE & COATINGS TECHNOLOGY (2009)
Magnetron sputter deposition: Linking discharge voltage with target properties
D. Depla et al.
THIN SOLID FILMS (2009)
Target utilization of planar magnetron sputtering using a rotating tilted unbalanced yoke magnet
Takayuki Iseki
VACUUM (2009)
Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma
Joakim Andersson et al.
APPLIED PHYSICS LETTERS (2008)
Velocity distribution of neutral species during magnetron sputtering by Fabry-Perot interferometry
N. Britun et al.
APPLIED PHYSICS LETTERS (2008)
Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion
Joakim Andersson et al.
APPLIED PHYSICS LETTERS (2008)
Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions
Andre Anders
APPLIED PHYSICS LETTERS (2008)
Ion composition produced by high power impulse magnetron sputtering discharges near the substrate
A. P. Ehiasarian et al.
JOURNAL OF APPLIED PHYSICS (2008)
Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper
David Horwat et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2008)
Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge
A. Hecimovic et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2008)
Highly ionized fluxes of sputtered titanium atoms in high-power pulsed magnetron discharges
P. Kudlacek et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2008)
Anomalous electron transport in high power impulse magnetron sputtering
Daniel Lundin et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2008)
Cross-field ion transport during high power impulse magnetron sputtering
Daniel Lundin et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2008)
A bulk plasma model for dc and HiPIMS magnetrons
N. Brenning et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2008)
Hysteresis-free reactive high power impulse magnetron sputtering
E. Wallin et al.
THIN SOLID FILMS (2008)
The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering
Jens Emmerlich et al.
VACUUM (2008)
Plasma dynamic in chromium and titanium HIPIMS discharges
Alena Vetushka et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2008)
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering
Andre Anders et al.
JOURNAL OF APPLIED PHYSICS (2007)
Experimental study of a pre-ionized high power pulsed magnetron discharge
P. Vasina et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2007)
Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering
K. Sarakinos et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2007)
Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion
A. P. Ehiasarian et al.
JOURNAL OF APPLIED PHYSICS (2007)
Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
J. Alami et al.
THIN SOLID FILMS (2007)
Ion flux characteristics in high-power pulsed magnetron sputtering discharges
J. Vlcek et al.
EPL (2007)
Understanding the discharge voltage behavior during reactive sputtering of oxides
D. Depla et al.
JOURNAL OF APPLIED PHYSICS (2007)
High-power pulsed sputtering using a magnetron with enhanced plasma confinement
Jaroslav Vlcek et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2007)
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
J. Bohlmark et al.
THIN SOLID FILMS (2006)
Guiding the deposition flux in an ionized magnetron discharge
J. Bohlmark et al.
THIN SOLID FILMS (2006)
On the deposition rate in a high power pulsed magnetron sputtering discharge
J. Alami et al.
APPLIED PHYSICS LETTERS (2006)
Blue diode laser absorption spectroscopy of pulsed magnetron discharge
Jiri Olejnicek et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS (2006)
Ionized physical vapor deposition (IPVD): A review of technology and applications
Ulf Helmersson et al.
THIN SOLID FILMS (2006)
Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures
Jon M. Andersson et al.
JOURNAL OF APPLIED PHYSICS (2006)
Flat erosion magnetron sputtering with a moving unbalanced magnet
Takayuki Iseki
VACUUM (2006)
Transport of ionized metal atoms in high-power pulsed magnetron discharges assisted by inductively coupled plasma
S Konstantinidis et al.
APPLIED PHYSICS LETTERS (2006)
Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges
S Konstantinidis et al.
JOURNAL OF APPLIED PHYSICS (2006)
Control of reactive sputtering processes
WD Sproul et al.
THIN SOLID FILMS (2005)
Influence of electron recapture by the cathode upon the discharge characteristics in dc planar magnetrons
I Kolev et al.
PHYSICAL REVIEW E (2005)
Deposition of Ti1-xAlxN using bipolar pulsed dual magnetron sputtering
M Åstrand et al.
SURFACE & COATINGS TECHNOLOGY (2005)
Ion-acoustic solitary waves in a high power pulsed magnetron sputtering discharge
KB Gylfason et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2005)
Plasma dynamics in a highly ionized pulsed magnetron discharge
J Alami et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2005)
High-energy ions and atoms sputtered and reflected from a magnetron source for deposition of magnetic thin films
H Matsui et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2005)
Fundamental understanding and modeling of reactive sputtering processes
S Berg et al.
THIN SOLID FILMS (2005)
Spatial electron density distribution in a high-power pulsed magnetron discharge
J Bohlmark et al.
IEEE TRANSACTIONS ON PLASMA SCIENCE (2005)
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces
J Alami et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2005)
Target material pathways model for high power pulsed magnetron sputtering
DJ Christie
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2005)
Two-dimensional fluid approach to the dc magnetron discharge
C Costin et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2005)
Ionization of sputtered metals in high power pulsed magnetron sputtering
J Bohlmark et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2005)
Electron transport in the downstream region of planar unbalanced magnetron discharge
SH Seo et al.
JOURNAL OF APPLIED PHYSICS (2004)
Measurements of electron energy distribution functions and electron transport in the downstream region of an unbalanced dc magnetron discharge
SH Seo et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2004)
Power supply with arc handling for high peak power magnetron sputtering
DJ Christie et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2004)
Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique
AP Ehiasarian et al.
THIN SOLID FILMS (2004)
Measurement of the magnetic field change in a pulsed high current magnetron discharge
J Bohlmark et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2004)
Pulsed plasmas foil sputtering applications
WD Sproul et al.
SURFACE ENGINEERING (2004)
Fundamentals of pulsed plasmas for materials processing
A Anders
SURFACE & COATINGS TECHNOLOGY (2004)
Experimental investigation of low-frequency waves propagating in a direct current planar magnetron plasma
E Martines et al.
PHYSICS OF PLASMAS (2004)
Equipment, materials and processes:: a review of high rate sputtering technology for glass coating
SJ Nadel et al.
THIN SOLID FILMS (2003)
High power pulsed magnetron sputtered CrNx films
AP Ehiasarian et al.
SURFACE & COATINGS TECHNOLOGY (2003)
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge
JT Gudmundsson et al.
SURFACE & COATINGS TECHNOLOGY (2002)
Influence of high power densities on the composition of pulsed magnetron plasmas
AP Ehiasarian et al.
VACUUM (2002)
Measurement of the plasma potential in a magnetron discharge and the prediction of the electron drift speeds
JW Bradley et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2001)
Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering
J Xu et al.
THIN SOLID FILMS (2001)
Electrostatic fluctuations in a direct current magnetron sputtering plasma
E Martines et al.
PHYSICS OF PLASMAS (2001)
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
JT Gudmundsson et al.
APPLIED PHYSICS LETTERS (2001)
Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. I. Direct current-driven discharge
S Kondo et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2001)
Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. II. Radio frequency-driven discharge
S Kondo et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2001)
Pulsed dc magnetron discharge for high-rate sputtering of thin films
J Musil et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2001)
Reactive pulsed magnetron sputtering process for alumina films
PJ Kelly et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2000)
Ionization of sputtered material in a planar magnetron discharge
C Christou et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2000)
Self-consistent particle modelling of dc magnetron discharges of an O2/Ar mixture
K Nanbu et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2000)
Production of large-area coatings on glasses and plastics
SP Bugaev et al.
SURFACE & COATINGS TECHNOLOGY (2000)
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
K Macák et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2000)
Mechanical properties of titanium nitride coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering
JW Lim et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2000)
Magnetron sputtering: a review of recent developments and applications
PJ Kelly et al.
VACUUM (2000)
Ionization enhancement in ionized magnetron sputter deposition
J Joo
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2000)
Share Paper
