Related references
Note: Only part of the references are listed.Recent advances in modulated pulsed power magnetron sputtering for surface engineering
Jianliang Lin et al.
JOM (2011)
High rate deposition of thick CrN and Cr2N coatings using modulated pulse power (MPP) magnetron sputtering
Jianliang Lin et al.
SURFACE & COATINGS TECHNOLOGY (2011)
Effect of Negative Substrate Bias on the Structure and Properties of Ta Coatings Deposited Using Modulated Pulse Power Magnetron Sputtering
Jianliang Lin et al.
IEEE TRANSACTIONS ON PLASMA SCIENCE (2010)
Deposition rates of high power impulse magnetron sputtering: Physics and economics
Andre Anders
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2010)
The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate
Anurag Mishra et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2010)
Microstructure control of CrNx films during high power impulse magnetron sputtering
G. Greczynski et al.
SURFACE & COATINGS TECHNOLOGY (2010)
The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering
Jianliang Lin et al.
SURFACE & COATINGS TECHNOLOGY (2010)
On the film density using high power impulse magnetron sputtering
Mattias Samuelsson et al.
SURFACE & COATINGS TECHNOLOGY (2010)
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
K. Sarakinos et al.
SURFACE & COATINGS TECHNOLOGY (2010)
Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering
J. Lin et al.
SURFACE & COATINGS TECHNOLOGY (2009)
Modulated pulse power sputtered chromium coatings
Jianliang Lin et al.
THIN SOLID FILMS (2009)
A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering
K. Sarakinos et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2008)
High power pulsed magnetron sputtering of transparent conducting oxides
V. Sittinger et al.
THIN SOLID FILMS (2008)
Mechanical properties and oxidation behaviour of (Al,Cr)N and (Al,Cr,Si)N coatings for cutting tools deposited by HPPMS
K. Bobzin et al.
THIN SOLID FILMS (2008)
Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering
K. Sarakinos et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2007)
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
J. Bohlmark et al.
THIN SOLID FILMS (2006)
Guiding the deposition flux in an ionized magnetron discharge
J. Bohlmark et al.
THIN SOLID FILMS (2006)
Hot target sputtering: A new way for high-rate deposition of stoichiometric ceramic films
D. Mercs et al.
SURFACE & COATINGS TECHNOLOGY (2006)
On the deposition rate in a high power pulsed magnetron sputtering discharge
J. Alami et al.
APPLIED PHYSICS LETTERS (2006)
Ionized physical vapor deposition (IPVD): A review of technology and applications
Ulf Helmersson et al.
THIN SOLID FILMS (2006)
Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel
M. Lattemann et al.
SURFACE & COATINGS TECHNOLOGY (2006)
Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges
S Konstantinidis et al.
JOURNAL OF APPLIED PHYSICS (2006)
Target material pathways model for high power pulsed magnetron sputtering
DJ Christie
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2005)
Review of cathodic arc deposition technology at the start of the new millennium
DM Sanders et al.
SURFACE & COATINGS TECHNOLOGY (2000)
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
K Macák et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2000)