Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 28, Issue 1, Pages 108-111Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.3271136
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Funding
- Institute for the Promotion of Innovation through Science and Technology in Flanders [60030]
- Research Foundation of Flanders
- EPSRC in U.K [EP/D049202/1]
- Engineering and Physical Sciences Research Council [EP/D049202/1] Funding Source: researchfish
- EPSRC [EP/D049202/1] Funding Source: UKRI
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Both the industrially favorable deposition technique, high power impulse magnetron sputtering (HIPIMS), and the industrially popular rotating cylindrical magnetron have been successfully combined. A stable operation without arcing, leaks, or other complications for the rotatable magnetron was attained, with current densities around 11 A cm(-2). For Ti and Al, a much higher degree in ionization in the plasma region was observed for the HIPIMS mode compared to the direct current mode. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3271136]
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