Journal
PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA
Volume 112, Issue 35, Pages 10879-10883Publisher
NATL ACAD SCIENCES
DOI: 10.1073/pnas.1424760112
Keywords
topological bands; graphene; van der Waals heterostructure
Categories
Funding
- National Science Foundation (NSF) Science and Technology Center for Integrated Quantum Materials, NSF Grant [DMR-1231319]
- US Army Research Laboratory
- US Army Research Office through Institute for Soldier Nanotechnologies [W911NF-13-D-0001]
- Burke Fellowship at Caltech
- Sherman Fairchild Foundation
- National Science Scholarship
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We outline a designer approach to endow widely available plain materials with topological properties by stacking them atop other nontopological materials. The approach is illustrated with a model system comprising graphene stacked atop hexagonal boron nitride. In this case, the Berry curvature of the electron Bloch bands is highly sensitive to the stacking configuration. As a result, electron topology can be controlled by crystal axes alignment, granting a practical route to designer topological materials. Berry curvature manifests itself in transport via the valley Hall effect and long-range chargeless valley currents. The nonlocal electrical response mediated by such currents provides diagnostics for band topology.
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