4.6 Article

Dependence of inverse-spin Hall effect and spin-rectified voltage on tantalum thickness in Ta/CoFeB bilayer structure

Journal

APPLIED PHYSICS LETTERS
Volume 106, Issue 3, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4906487

Keywords

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Funding

  1. Pioneer Research Center Program through the National Research Foundation of Korea - Ministry of Science, ICT & Future Planning [2011-0027908]
  2. R&D Program for Industrial Core Technology - Ministry of Trade, Industry and Energy (MOTIE), Republic of South Korea [10044723]
  3. National Research Foundation - Ministry of Science, ICT & Future Planning [NRF-2012R1A1A1041590]
  4. National Research Foundation of Korea [2011-0027908] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Ta-layer thickness (t(Ta)) dependence of the measured DC voltage V from the inverse-spin Hall effect (ISHE) in Ta/CoFeB bilayer structure is experimentally investigated using the ferromagnetic resonance in the TE011 resonant cavity. The ISHE signals excluding the spin-rectified effect (SRE) were separated from the fitted curve of V against t(Ta). For t(Ta) approximate to lambda(Ta) (Ta-spin diffusion length = 2.7 nm), the deviation in ISHE voltage V-ISH between the experimental and theoretical values is significantly increased because of the large SRE contribution, which also results in a large deviation in the spin Hall angle theta(SH) (from 10% to 40%). However, when tTa >> lambda(Ta), the V-ISH values are consistent with theoretical values because the SRE terms become negligible, which subsequently improves the accuracy of the obtained theta(SH) within 4% deviation. The results will provide an outline for an accurate estimation of the theta(SH) for materials with small lambda value, which would be useful for utilizing the spin Hall effect in a 3-terminal spintronic devices in which magnetization can be controlled by in-plane current. (C) 2015 AIP Publishing LLC.

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