Journal
APPLIED PHYSICS LETTERS
Volume 107, Issue 4, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.4927593
Keywords
-
Categories
Funding
- FEI Company
- Australian Research Council [DP140102721]
- John Stocker Postgraduate Scholarship from the Science and Industry Endowment Fund
Ask authors/readers for more resources
Nanopatterning of graphene and diamond by low energy (<= 30 keV) electrons has previously been attributed to mechanisms that include atomic displacements caused by knock-on, electron beam heating, sputtering by ionized gas molecules, and chemical etching driven by a number of gases that include N-2. Here, we show that a number of these mechanisms are insignificant, and the nanopatterning process can instead be explained by etching caused by electron induced dissociation of residual H2O molecules. Our results have significant practical implications for gas-mediated electron beam nanopatterning techniques and help elucidate the underlying mechanisms. (C) 2015 AIP Publishing LLC.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available