4.6 Article

Enhanced third harmonic generation from the epsilon-near-zero modes of ultrathin films

Journal

APPLIED PHYSICS LETTERS
Volume 106, Issue 15, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4917457

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Funding

  1. U.S. Department of Energy, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering
  2. Laboratory Directed Research and Development program at Sandia National Laboratories
  3. U.S. Department of Energy's National Nuclear Security Administration [DE-AC04-94AL85000]
  4. U.S. Army Aviation and Missile Research Development and Engineering Center

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We experimentally demonstrate efficient third harmonic generation from an indium tin oxide nanofilm (lambda/42 thick) on a glass substrate for a pump wavelength of 1.4 mu m. A conversion efficiency of 3.3 x 10(-6) is achieved by exploiting the field enhancement properties of the epsilon-near-zero mode with an enhancement factor of 200. This nanoscale frequency conversion method is applicable to other plasmonic materials and reststrahlen materials in proximity of the longitudinal optical phonon frequencies. (c) 2015 AIP Publishing LLC.

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