Journal
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION
Volume 26, Issue 11, Pages 2327-2335Publisher
OPTICAL SOC AMER
DOI: 10.1364/JOSAA.26.002327
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Funding
- HiTech Research and Development Program of China [2006AA04Z325]
- National Natural Science Foundation of China (NSFC) [50775090]
- National Basic Research Program of China [2009CB724204]
- Program for New Century Excellent Talent in Universitys of China [NCET-06-0639]
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Model-based infrared reflectrometry (MBIR) has been introduced recently For characterization of high-aspectratio deep trench structures in microelectronics. The success of this technique relies heavily on accurate modeling of trench structures and fast extraction of trench parameters. In this paper, we propose a modeling method named corrected effective medium approximation (CEMA) for accurate and fast reflectivity calculation of deep trench structures. We also develop a method combining an artificial neural network (ANN) and a Levenberg-Marquardt (LM) algorithm for robust and fast extraction of geometric parameters from the measured reflectance spectrum. The simulation and experimental work conducted on typical deep trench structures has verified the proposed methods and demonstrated that the improved MBIR metrology achieves highly accurate measurement results as well as fast computation speed. (C) 2009 Optical Society of America
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