4.1 Article Proceedings Paper

Extra-Low Temperature Growth of ZnO Thin Films by Atomic Layer Deposition

Journal

JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 53, Issue 5, Pages 2880-2883

Publisher

KOREAN PHYSICAL SOC
DOI: 10.3938/jkps.53.2880

Keywords

Low-temperature growth; Zinc oxide; Atomic layer deposition; Optical properties

Ask authors/readers for more resources

We report on ZnO thin films grown by the atomic layer deposition method at temperature of 200 degrees C and below. Low-temperature ZnO layers show bright excitonic photoluminescence for as-grown samples. Defect-related bands usually observed in the green and the red regions are of low intensity and are absent for ZnO layers grown at 140 degrees C - 200 degrees C, which is evidence that competing radiative decay channels are ineffective. We relate this to a blocking of the vacancy formation, which is thermally suppressed at low growth temperature. Hall measurements show that the free-carrier concentration strongly depends on the growth temperature and has the lowest value of 2 . 10(17)/cm(3) for films grown at 100 degrees C and below.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.1
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available