Journal
JOURNAL OF THE EUROPEAN OPTICAL SOCIETY-RAPID PUBLICATIONS
Volume 7, Issue -, Pages -Publisher
EUROPEAN OPTICAL SOC
DOI: 10.2971/jeos.2012.12035
Keywords
Silicon; non-linear absorption; opto-mechanical processes; silicon photonics
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We introduce a novel method of optically inducing microsized subsurface structures using non-linear absorption of near infrared light in mono-crystalline silicon. We discuss the physical processes such as multi-photon absorption and self focussing in the material. The results presented in this paper demonstrate a new method of subsurface modifications in silicon and may open up novel avenues for optical devices embedded in silicon and optical process for the separation of wafers from their ingots. [DOI: http://dx.doi.org/10.2971/jeos.2012.12035]
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