Optical characterization of stereolithography alumina suspensions using the Kubelka-Munk model

The multiple light scattering in concentrated alumina suspensions adapted to stereolithography can be modeled using diffuse reflectance measurements coupled to the Kubelka-Munk model. The penetration depth of UV radiation can be related to the scattering coefficient allowing the prediction of the cure depth with an accuracy of 20%. (c) 2008 Elsevier Ltd. All rights reserved.