Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 157, Issue 3, Pages H312-H317Publisher
ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.3276059
Keywords
chemical mechanical polishing; copper; erosion; integrated circuit interconnections; organic compounds; planarisation
Funding
- Center for Advanced Materials Processing (CAMP) at Clarkson University, Potsdam, NY
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Chemical mechanical polishing (CMP) pads are generally designed to play a passive role in terms of chemical reactions that occur on the surface to be polished. For copper CMP, a pad that is capable of initiating and controlling various chemical reactions on the copper surface can bring another dimension of flexibility to the CMP process. This work investigates such a model pad for its potential applications in copper CMP. More specifically, the physical and chemical properties of a polyurethane pad containing 1H-benzotriazole (BTA) are examined. When applied to Cu blanket wafers, the BTA-containing pad yielded a higher removal rate compared to the conventional CMP process with the reference pad. For patterned wafer polishing, the results indicate that the BTA-containing pad is effective in improving the step height reduction efficiency and in minimizing dishing and erosion. The potential applications of a pad with such a design for gaining a fundamental understanding of the copper CMP process are discussed based on these experimental results.
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