Related references
Note: Only part of the references are listed.Instability of metal barrier with porous methyl silsesquioxane films
Pei-I Wang et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2008)
Study of Cu diffusion in porous dielectrics using secondary-ion-mass spectrometry
OR Rodriguez et al.
JOURNAL OF APPLIED PHYSICS (2005)
Correlation between bond cleavage in parylene N and the degradation of its dielectric properties
JJ Senkevich et al.
ELECTROCHEMICAL AND SOLID STATE LETTERS (2004)
Investigation of electrical conduction in carbon-doped silicon oxide using a voltage ramp method
KY Yiang et al.
APPLIED PHYSICS LETTERS (2003)
Electrical transport phenomena in aromatic hydrocarbon polymer
PT Liu et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2003)
Physics of copper in silicon
AA Istratov et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2002)
Metal drift behavior in low dielectric constant organosiloxane polymer
A Mallikarjunan et al.
APPLIED PHYSICS LETTERS (2001)
Molecular model for intrinsic time-dependent dielectric breakdown in SiO2 dielectrics and the reliability implications for hyper-thin gate oxide
JW McPherson et al.
SEMICONDUCTOR SCIENCE AND TECHNOLOGY (2000)
Share Paper
