4.8 Article

Vapor-Phase Metalation by Atomic Layer Deposition in a Metal-Organic Framework

Journal

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 135, Issue 28, Pages 10294-10297

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/ja4050828

Keywords

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Funding

  1. DOE-BES [DE-FG02-08ER15967]
  2. DOE EERE Postdoctoral Research Award, EERE Fuel Cell Technologies Program
  3. DOE [DE-AC05-060R23100]
  4. Foundation for Polish Science through the Kolumb Program
  5. Royal Society (UK)
  6. Chemical Sciences, Geosciences, and Biosciences Division, Office of BES, Office of Science, U.S. DOE [DE-FG-02-03ER15457]

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Metal-organic frameworks (MOFs) have received attention for a myriad of potential applications including catalysis, gas storage, and gas separation. Coordinatively unsaturated metal ions often enable key functional behavior of these materials. Most commonly, MOFs have been metalated from the condensed phase (i.e., from solution). Here we introduce a new synthetic strategy capable of metallating MOFs from the gas phase: atomic layer deposition (ALD). Key to enabling metalation by AID In MOFs (AIM) was the synthesis of NU-1000, a new, thermally stable, Zr-based MOP with spatially oriented -OH groups and large 1D mesopores and apertures.

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