4.8 Article

Photo-Cross-Linking-Assisted Thermal Stability of DNA Origami Structures and Its Application for Higher-Temperature Self-Assembly

Journal

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 133, Issue 37, Pages 14488-14491

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/ja204546h

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Funding

  1. Japan Science and Technology Corporation (JST)
  2. iCeMS, Kyoto University
  3. Ministry of Education, Culture, Sports, Science and Technology (MEXT)
  4. Grants-in-Aid for Scientific Research [21603008, 10J00436, 22310081] Funding Source: KAKEN

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Heat tolerance of DNA origami structures has been improved about 30 degrees C by photo-cross-linking of 8-methoxypsoralen. To demonstrate one of its applications, the cross-linked origami were used for higher-temperature self-assembly, which markedly increased the yield of the assembled product when compared to the self-assembly of non-cross-linked origami at lower-temperature. By contrast, at higher-temperature annealing, native non-cross-linked tiles did not self-assemble to yield the desired product; however, they formed a nonspecific broken structure.

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