Exploiting Substrate Stress To Modify Nanoscale SAM Patterns

We describe a simple method based on postadsorption substrate stress induction to modify and control nanoscale phase-separated patterns formed in self-assembled monolayers. We show using mesoscale computer simulations and experiments that this method helps quickly progress a kinetically arrested patchy pattern into the equilibrium striped pattern, which is otherwise difficult to access. This work also establishes the role of curvature in the formation of aligned stripes several molecules wide on spherical nanoparticles and nanocylinders.