4.8 Article

Use of a High Electron-Affinity Molybdenum Dithiolene Complex to p-Dope Hole-Transport Layers

Journal

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 131, Issue 35, Pages 12530-+

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/ja904939g

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Funding

  1. Solvay Corporation
  2. the National Science Foundation [DMR-0705920]
  3. Department of Energy [DE-FG02-04ER46165]

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Experimental and theoretical results are presented on the electronic structure of molybdenum tris[1,2-bis(trifluoromethyl) ethane-1,2-dithiolene] (Mo(tfd)(3)), a high electron-affinity organometallic complex that constitutes a promising candidate as a p-dopant for organic molecular semiconductors. The electron affinity of the compound, determined via inverse photoemission spectroscopy, is 5.6 eV, which is 0.4 eV Larger than that of the commonly used p-dopant F-4-TCNQ. The LUMO level of Mo(tfd)(3) is calculated to be delocalized over the whole molecule, which is expected to Lead to low pinning potential. Efficient p-doping of a standard hole transport material (alpha-NPD) is demonstrated via measurements of Fermi level shifts and enhanced conductivity in alpha-NPD: 1% Mo(tfd)(3). Rutherford backscattering measurements show good stability of the three-dimensional Mo(tfd)(3) molecule in the host matrix with respect to diffusion.

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