Journal
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 131, Issue 47, Pages 17062-+Publisher
AMER CHEMICAL SOC
DOI: 10.1021/ja907952g
Keywords
-
Categories
Funding
- German Science Foundation [DFG-DE-790-3]
- Ruhr-University Research School
Ask authors/readers for more resources
Deposition of a rare earth nitride thin film using a chemical gas phase deposition technique is reported for the first time. The gadolinium tris-guanidinate complex [Gd[('PrN)(2)CNMe(2)}(3)] is found to be an effective single source precursor for the MOCVD growth of gadolinium nitride (GdN) thin films.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available