4.6 Article

Thermal transport in tantalum oxide films for memristive applications

Journal

APPLIED PHYSICS LETTERS
Volume 107, Issue 2, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4926921

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Funding

  1. Sandia National Laboratories Laboratory Directed Research and Development Program
  2. U.S. Department of Energy's National Nuclear Security Administration [DE-AC04-94AL85000]

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The thermal conductivity of amorphous TaOx memristive films having variable oxygen content is measured using time domain thermoreflectance. Thermal transport is described by a two-part model where the electrical contribution is quantified via the Wiedemann-Franz relation and the vibrational contribution by the minimum thermal conductivity limit for amorphous solids. The vibrational contribution remains constant near 0.9W/mK regardless of oxygen concentration, while the electrical contribution varies from 0 to 3.3 W/mK. Thus, the dominant thermal carrier in TaOx switches between vibrations and charge carriers and is controllable either by oxygen content during deposition, or dynamically by field-induced charge state migration. (C) 2015 AIP Publishing LLC.

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