Journal
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 130, Issue 8, Pages 2420-2421Publisher
AMER CHEMICAL SOC
DOI: 10.1021/ja078202j
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Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[(Pr2P)-Pr-i(S)NP(Se)Pr-i(2)](2)} just by altering the deposition temperature using CVD.
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