Journal
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
Volume 94, Issue 3, Pages 679-682Publisher
WILEY
DOI: 10.1111/j.1551-2916.2010.04386.x
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Funding
- National Natural Science Foundation of China [90405015, 51002120]
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Boron nitride thin layers are in situ fabricated on chemical vapor-deposited boron in ammonia gas. Characterization by X-ray photoelectron spectroscopy and transmission electron microscopy reveals that the nitridation is dominated by different processes with varying temperatures. Below 1300 degrees C the surface reaction is in control and leads to the formation of uniformly thin layer with mostly sp3 boron nitride. As the temperature rises, the nitridation is gradually turned as a diffusion-determining process, after which a thicker but uneven layer with hexagonal sp2 boron nitride is produced.
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