Journal
JOURNAL OF SYNCHROTRON RADIATION
Volume 19, Issue -, Pages 216-222Publisher
WILEY-BLACKWELL
DOI: 10.1107/S0909049511052320
Keywords
in situ X-ray measurement; thin-film growth; sputter deposition; deposition chamber; texture; polycrystalline materials
Categories
Funding
- ANKA
- Excellence Initiative within KIT-Nanolab@ANKA
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A new sputtering system for in situ X-ray experiments during DC and RF magnetron sputtering is described. The outstanding features of the system are the modular design of the vacuum chamber, the adjustable deposition angle, the option for plasma diagnostics, and the UHV sample transfer in order to access complementary surface analysis methods. First in situ diffraction and reflectivity measurements during RF and DC deposition of vanadium carbide demonstrate the performance of the set-up.
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